標題: Substrate-insensitive atomic layer deposition of plasmonic titanium nitride films
作者: Yu, Ing-Song
Cheng, Hsyi-En
Chang, Chun-Chieh
Lin, Yan-Wei
Chen, Hou-Tong
Wang, Yao-Chin
Yang, Zu-Po
光電系統研究所
Institute of Photonic System
公開日期: 1-Mar-2017
摘要: The plasmonic properties of titanium nitride (TiN) films depend on the type of substrate when using typical deposition methods such as sputtering. Here we show atomic layer deposition (ALD) of TiN films with very weak dependence of plasmonic properties on the substrate, which also suggests the prediction and evaluation of plasmonic performance of TiN nanostructures on arbitrary substrates under a given deposition condition. Our results also observe that substrates with more nitrogen-terminated (N-terminated) surfaces will have significant impact on the deposition rate as well as the film plasmonic properties. We further illustrate that the plasmonic properties of ALD TiN films can be tailored by simply adjusting the deposition and/or post-deposition annealing temperatures. Such characteristics and the capability of conformal coating make ALD TiN films on templates ideal for applications that require the fabrication of complex 3D plasmonic nanostructures. (C) 2017 Optical Society of America
URI: http://dx.doi.org/10.1364/OME.7.000777
http://hdl.handle.net/11536/144220
ISSN: 2159-3930
DOI: 10.1364/OME.7.000777
期刊: OPTICAL MATERIALS EXPRESS
Volume: 7
Issue: 3
起始頁: 777
結束頁: 784
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