標題: 微影製程中光阻塗佈異常箭影的改善研究
Improvement of Photoresist coating abnormal shadow arrow study in Lithography Production
作者: 張正甫
吳耀銓
Chang, Cheng-Fu
Wu, Yew-chung
工學院半導體材料與製程設備學程
關鍵字: 微影製程;光阻塗佈;箭影異常;光阻流體;旋轉塗佈異常;Lithography;photoresist coating;abnormal shadow arrows;resist fluid;Resist spin coating abnormal
公開日期: 2016
URI: http://etd.lib.nctu.edu.tw/cdrfb3/record/nctu/#GT070261308
http://hdl.handle.net/11536/141217
Appears in Collections:Thesis