標題: Selective deposition of gold nanoparticles on SiO2/Si nanowire
作者: Sheu, JT
Chen, CC
Huang, PC
Hsu, ML
材料科學與工程學系奈米科技碩博班
Graduate Program of Nanotechnology , Department of Materials Science and Engineering
關鍵字: gold nanoparticles;scanning probe lithography;self-assembly;AEAPTMS
公開日期: 1-三月-2005
摘要: We demonstrate selective deposition of citrate-passivated gold nanoparticles onto silicon dioxide patterns. Further, selective deposition of gold nanoparticles on the oxides, generated by scanning probe lithography (SPL). surface of silicon nanowire is achieved. Main methodology is to form H-terminated silicon surface and hydroxyl group on SiO2 sample surface, then link amino function group only on SiO2 surface by self-assembly mechanism. N-(2-Aminoethyl)-3-aminopropyl-trimethoxysilane (AEAPTMS) pretreated sample was immersed in the gold colloidal solution such that the NH2 group become protonated forming NH3+. The NH3+ groups provide a negative charge bindable environment for citrate-passivated gold nanoparticles. Impact on different AEAPTMS dilute solvents is also investigated for the performance of selective deposition of gold nanoparticles. It is found that H-terminated sample surface effectively eliminated nonspecific reaction during silanization such that microscale or nanoscale selective deposition of gold nanoparticles is obtainable. The proposed method can be applied in both nanoelectronics and nanobiosensors. (c) 2005 Elsevier B.V. All rights reserved.
URI: http://dx.doi.org/10.1016/j.mee.2005.01.005
http://hdl.handle.net/11536/13921
ISSN: 0167-9317
DOI: 10.1016/j.mee.2005.01.005
期刊: MICROELECTRONIC ENGINEERING
Volume: 78-79
Issue: 
起始頁: 294
結束頁: 299
顯示於類別:會議論文


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  1. 000228589700049.pdf