標題: The preparation of mesoporous silica ultra-low-k film using ozone ashing treatment
作者: Cho, AT
Pan, FM
Chao, KJ
Liu, PH
Chen, JY
材料科學與工程學系
Department of Materials Science and Engineering
關鍵字: ozone ashing;low-k;thin film;mesoporous silica
公開日期: 1-七月-2005
摘要: The ozone ash treatment has been demonstrated to effectively remove the organic template at 200-300 degrees C as well as to enhance the mechanical strength of mesoporous silica films. The resulting films are of ordered pore structure, strong mechanical strength, and smooth surface. After reacting with hexamethyidisilazane, the silica film has been modified to hydrophobic from hydrophilic and exhibits an ultra-low dielectric constant (k <= 2) and a low leakage current density (10(-7) A/cm(2)) with good electrical reliability. (c) 2005 Elsevier B.V. All rights reserved.
URI: http://dx.doi.org/10.1016/j.tsf.2005.01.004
http://hdl.handle.net/11536/13516
ISSN: 0040-6090
DOI: 10.1016/j.tsf.2005.01.004
期刊: THIN SOLID FILMS
Volume: 483
Issue: 1-2
起始頁: 283
結束頁: 286
顯示於類別:期刊論文


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  1. 000229681700047.pdf