標題: Nearly Dislocation-free Ge/Si Heterostructures by Using Nanoscale Epitaxial Growth Method
作者: Luo, Guang-Li
Ko, Chih-Hsin
Wann, Clement H.
Chung, Cheng-Ting
Han, Zong-You
Cheng, Chao-Ching
Chang, Chun-Yen
Lin, Hau-Yu
Chien, Chao-Hsin
電子工程學系及電子研究所
Department of Electronics Engineering and Institute of Electronics
關鍵字: germanium;dislocations;nano treches;epitaxy
公開日期: 1-Jan-2012
摘要: The selective growth of germanium into nanoscale trenches on silicon substrates was investigated. These nanoscale trenches-the smallest size of which was 50 nm-were fabricated using the state-of-the-art shallow trench isolation technique. The quality of the Ge films was evaluated using transmission electron microscopy. It was found that the formation of threading dislocations (TDs) was effectively suppressed when using this deposition technique. It was considered that for the Ge grown in nanoscale Si areas (e. g., several tens of nanometers), the TDs were readily removed during cyclic thermal annealing, predominantly because their gliding distance to the SiO2 sidewalls was very short. Therefore, nanoscale epitaxial growth technology can be used to deposit Ge films on lattice-mismatched Si substrates with a reduced defect density. (C) 2011 Published by Elsevier B.V. Selection and/or peer-review under responsibility of Garry Lee
URI: http://dx.doi.org/10.1016/j.phpro.2012.03.057
http://hdl.handle.net/11536/134760
ISSN: 1875-3892
DOI: 10.1016/j.phpro.2012.03.057
期刊: INTERNATIONAL CONFERENCE ON SOLID STATE DEVICES AND MATERIALS SCIENCE
Volume: 25
起始頁: 105
結束頁: 109
Appears in Collections:Conferences Paper


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