|標題:||Reducing operation voltages by introducing a low-k switching layer in indium-tin-oxide-based resistance random access memory|
Sze, Simon M.
Department of Electronics Engineering and Institute of Electronics
|摘要:||In this letter, we inserted a low dielectric constant (low-k) or high dielectric constant (high-k) material as a switching layer in indium-tin-oxide-based resistive random-access memory. After measuring the two samples, we found that the low-k material device has very low operating voltages (-80 and 110mV for SET and RESET operations, respectively). Current fitting results were then used with the COMSOL software package to simulate electric field distribution in the layers. After combining the electrical measurement results with simulations, a conduction model was proposed to explain resistance switching behaviors in the two structures. (C) 2016 The Japan Society of Applied Physics|
|期刊:||APPLIED PHYSICS EXPRESS|
|Appears in Collections:||Articles|