標題: Stresses and temperature stability of dense wavelength division multiplexing filters prepared by reactive ion-assisted e-gun evaporation
作者: Wei, CT
Shieh, HPD
光電工程學系
顯示科技研究所
Department of Photonics
Institute of Display
關鍵字: DWDM filters;reactive ion-assisted deposition;compression stress;Fabry-Perot filter;mutilayer
公開日期: 1-十月-2005
摘要: In this paper, we report the in situ measurement of the temperature stability of narrow-band-pass filters on different types of substrate, for dense wavelength division multiplexing (DWDM) filters in optical-fiber transmission systems. The DWDM filters were designed as all-dielectric Fabry-Perot filters and fabricated by reactive ion-assisted deposition. Ta,05 and SiO(2) were used as high- and low-refractive-index layers, respectively, for constructing the DWDM filters. The accuracy and stability of the coating process were evaluated for fabricating the DWDM filters for the temperature stability of the center wavelength. The center wavelength shift was determined to be greatly dependent on the coefficient of thermal expansion of the substrate on which the filter is deposited.
URI: http://dx.doi.org/10.1143/JJAP.44.7577
http://hdl.handle.net/11536/13199
ISSN: 0021-4922
DOI: 10.1143/JJAP.44.7577
期刊: JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS
Volume: 44
Issue: 10
起始頁: 7577
結束頁: 7581
顯示於類別:期刊論文


文件中的檔案:

  1. 000232739300079.pdf