標題: New triple self-aligned (SA3) split-gate flash cell with T-shaped source coupling
作者: Sung, HC
Lei, TF
Huang, CM
Kao, YC
Lin, YT
Wang, CS
電子工程學系及電子研究所
Department of Electronics Engineering and Institute of Electronics
關鍵字: flash;EEPROM;split-gate;source-side injection;source coupling
公開日期: 1-十月-2005
摘要: A new triple self-aligned (SA3) split-gate flash cell with a T-shaped source coupling approach is described in this paper. This novel structure can significantly enhance coupling capacitance between the Source and floating gate without increasing cell size. The enhancement can be simply modulated by an oxide-etching step. This new structure can be applied to program voltage reduction and cell size scaling. For program voltage reduction, the maximum program voltage of the new cell can be reduced from 7.4 to 6AV, which is characterized by a newly developed methodology for program vs disturb window characterization. For cell size scaling, comparable sort-1 and sort-2 yields are demonstrated using the new cell with a shorter floating length and a shallower source junction. To understand the relationship between source coupling ratio (SCR) and the program/erase mechanism, an insightful discussion on the program and erase mechanisms for our split-gate flash cell is also shown in this paper.
URI: http://dx.doi.org/10.1143/JJAP.44.7377
http://hdl.handle.net/11536/13193
ISSN: 0021-4922
DOI: 10.1143/JJAP.44.7377
期刊: JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS
Volume: 44
Issue: 10
起始頁: 7377
結束頁: 7383
顯示於類別:期刊論文


文件中的檔案:

  1. 000232739300034.pdf