標題: Electrical properties of amorphous silicon films with different thicknesses in metal/insulator/semiconductor structures
作者: Tai, YH
Su, FC
Chang, WS
Feng, MS
Cheng, HC
材料科學與工程學系
電子工程學系及電子研究所
Department of Materials Science and Engineering
Department of Electronics Engineering and Institute of Electronics
關鍵字: density of states (DOS);field-effect conductance;hydrogenated amorphous silicon (a-Si:H);thin-film transistors (TFT)
公開日期: 1-五月-1996
摘要: The density of states (DOS) of hydrogenated amorphous silicon (a-Si:H) is an important issue in the study of the physics of amorphous semiconductors. In many earlier reports concerning the analysis of the field-effect conductance metal/insulator/ a-Si:H structures, namely, thin-film transistors (TFTs), the potential at the semiconductor surface apart from the gate insulator/a-Si:H interface, i.e., the rear interface, was assumed to be zero. However, in principle, as the thickness of the semiconductor film is smaller than the theoretically expected width of the space charge region, this assumption no longer holds. Hence, it is necessary to reconsider the band-bending phenomena of the a-Si:H active layers. It was found that the DOS, which was extracted previously from the field-effect conductance of the TFTs based on the assumption of the zero-potential rear interface, was appropriate only for the thick a-Si:H films. As for the thin semiconductor films, the accurate DOS can be obtained by fitting the calculated field-effect conductance, with a surmised possible DOS, to the experimentally measured data via the method developed.
URI: http://dx.doi.org/10.1016/0254-0584(95)01666-I
http://hdl.handle.net/11536/1306
ISSN: 0254-0584
DOI: 10.1016/0254-0584(95)01666-I
期刊: MATERIALS CHEMISTRY AND PHYSICS
Volume: 44
Issue: 2
起始頁: 182
結束頁: 185
顯示於類別:期刊論文


文件中的檔案:

  1. A1996UH15700008.pdf