標題: Single-crystalline aluminum film for ultraviolet plasmonic nanolasers
作者: Chou, Bo-Tsun
Chou, Yu-Hsun
Wu, Yen-Mo
Chung, Yi-Cheng
Hsueh, Wei-Jen
Lin, Shih-Wei
Lu, Tien-Chang
Lin, Tzy-Rong
Lin, Sheng-Di
照明與能源光電研究所
電子工程學系及電子研究所
光電工程學系
Institute of Lighting and Energy Photonics
Department of Electronics Engineering and Institute of Electronics
Department of Photonics
公開日期: 27-Jan-2016
摘要: Significant advances have been made in the development of plasmonic devices in the past decade. Plasmonic nanolasers, which display interesting properties, have come to play an important role in biomedicine, chemical sensors, information technology, and optical integrated circuits. However, nanoscale plasmonic devices, particularly those operating in the ultraviolet regime, are extremely sensitive to the metal and interface quality. Thus, these factors have a significant bearing on the development of ultraviolet plasmonic devices. Here, by addressing these material-related issues, we demonstrate a low-threshold, high-characteristic-temperature metal-oxide-semiconductor ZnO nanolaser that operates at room temperature. The template for the ZnO nanowires consists of a flat single-crystalline Al film grown by molecular beam epitaxy and an ultrasmooth Al2O3 spacer layer synthesized by atomic layer deposition. By effectively reducing the surface plasmon scattering and metal intrinsic absorption losses, the high-quality metal film and the sharp interfaces formed between the layers boost the device performance. This work should pave the way for the use of ultraviolet plasmonic nanolasers and related devices in a wider range of applications.
URI: http://dx.doi.org/10.1038/srep19887
http://hdl.handle.net/11536/129655
ISSN: 2045-2322
DOI: 10.1038/srep19887
期刊: SCIENTIFIC REPORTS
Volume: 6
起始頁: 0
結束頁: 0
Appears in Collections:Articles


Files in This Item:

  1. 78dfd100c041023d357ca0a6b592fdac.pdf