標題: Organic airborne molecular contamination in semiconductor fabrication clean rooms - A review
作者: Den, W
Bai, HL
Kang, YH
環境工程研究所
Institute of Environmental Engineering
公開日期: 2006
摘要: Monitoring of airborne molecular contamination (AMC) has become a crucial element of cleanroom management as the production phase of semiconductor devices marches deep into sub-100-nm range. The current understandings of the AMC, particularly those with organic origins, are presented comprehensively in this article based on the research reports within the past ten years. Starting with a review of the chronological development of AMC problems and several approaches for the AMC classifications, this article also examines the merits of several available ambient sampling and surface analytical methods. The focal point of the article is to address the surface deposition potential of organic AMCs by experimentally correlating the surface speciation and abundance of the organic AMCs with their physical and chemical characteristics, together with the kinetic models delineating the rates of deposition for both single-and multiple-contaminant scenarios. In addition, the current progress of the AMC control strategies, especially the development of the chemical filtration technology, is also examined in the paper. (c) 2006 The Electrochemical Society.
URI: http://hdl.handle.net/11536/12939
http://dx.doi.org/10.1149/1.2147286
ISSN: 0013-4651
DOI: 10.1149/1.2147286
期刊: JOURNAL OF THE ELECTROCHEMICAL SOCIETY
Volume: 153
Issue: 2
起始頁: G149
結束頁: G159
顯示於類別:期刊論文


文件中的檔案:

  1. 000234543400064.pdf