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dc.contributor.authorYang, YWen_US
dc.contributor.authorWu, JBen_US
dc.contributor.authorWang, JLen_US
dc.contributor.authorLin, YFen_US
dc.contributor.authorChiu, HTen_US
dc.date.accessioned2014-12-08T15:17:27Z-
dc.date.available2014-12-08T15:17:27Z-
dc.date.issued2006-02-01en_US
dc.identifier.issn0039-6028en_US
dc.identifier.urihttp://dx.doi.org/10.1016/j.susc.2005.12.004en_US
dc.identifier.urihttp://hdl.handle.net/11536/12648-
dc.description.abstractChemisorption and thermal decomposition of metallorganic chemical vapor deposition precursors, (t-BuN)(2)W(NHBu-t)(2), bis(tertbutyl imido) bis(tert-butylamido) tungsten (BTBTT) and (t-BuN)(2)W(NEt2)(2), bis(tert-butylimido)bis(diethylamido)tungsten (BTBDT), on Cu(111) have been investigated by means of thermal desorption spectroscopy (TDS) and synchrotron-based X-ray photoelectron spectroscopy (SR-XPS) under ultrahigh vacuum conditions. The precursors remain intact upon chemisorption on Cu(111) at 100 K, and at 300 K both precursors decompose readily via the characteristic hydride abstraction/elimination pathways to produce two stable surface intermediates for each precursor. For BTBTT, one species is W(=NBu-t)(3) and the other is proposed to be a bridged amido complex, [(t-BuN)(2)W(mu-NBu-t)](2). In comparison, a W-imine complex and a W-N-C metallacycle are two intermediates produced from BTBDT, Annealing toward 800 K further decomposes the intermediates and the detectable desorption species are completely derived from the ligands. The desorption products from BTBTT include t-butylamine generated from alpha-H abstraction, isobutylene from gamma-H elimination, acetonitrile from beta-methyl elimination.. and molecular hydrogen. In addition to these desorption species, BTBDT produces hydrogen cyanide and imine (EtN = CHMe) via beta-H elimination, not possible with BTBTT due to the absence of beta-H in the ligands. Eventually, tungsten nitrides incorporating oxygen atoms and a small amount of graphitic carbons are formed and the stoichiometry is approximated as WN1.5O0.1. Oxygen incorporation, driven by a large oxide formation enthalpy, is sensitively dependent on the moisture exposure in UHV environment. (c) 2005 Elsevier B.V. All rights reserved.en_US
dc.language.isoen_USen_US
dc.subjectsynchrotron radiation photoelectron spectroscopyen_US
dc.subjectthermal desorption spectroscopyen_US
dc.subjectchemical vapor depositionen_US
dc.subjectsurface chemical reactionen_US
dc.subjectcopperen_US
dc.subjecttungsten nitridesen_US
dc.titleThermal decomposition mechanisms of tungsten nitride CVD precursors on Cu(111)en_US
dc.typeArticleen_US
dc.identifier.doi10.1016/j.susc.2005.12.004en_US
dc.identifier.journalSURFACE SCIENCEen_US
dc.citation.volume600en_US
dc.citation.issue3en_US
dc.citation.spage743en_US
dc.citation.epage754en_US
dc.contributor.department應用化學系zh_TW
dc.contributor.departmentDepartment of Applied Chemistryen_US
dc.identifier.wosnumberWOS:000235509300034-
dc.citation.woscount11-
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