Title: Fabrication of SiC Membrane HCG Blue Reflector Using Nanoimprint Lithography
Authors: Lai, Ying-Yu
Matsutani, Akihiro
Lu, Tien-Chang
Wang, Shing-Chung
Koyama, Fumio
光電工程學系
Department of Photonics
Keywords: SiC;HCG;Nanoimprint;III-N
Issue Date: 1-Jan-2015
Abstract: We designed and fabricated a suspended SiC-based membrane high contrast grating (HCG) reflectors. The rigorous coupled-wave analysis (RCWA) was employed to verify the structural parameters including grating periods, grating height, filling factors and air-gap height. From the optimized simulation results, the designed SiC-based membrane HCG has a wide reflection stopband (reflectivity (R) > 90%) of 135 nm for the TE polarization, which centered at 480 nm. The suspended SiC-based membrane HCG reflectors were fabricated by nanoimprint lithography and two-step etching technique. This achievement should have an impact on numerous III-N based photonic devices operating in the blue wavelength or even ultraviolet region.
URI: http://dx.doi.org/10.1117/12.2077391
http://hdl.handle.net/11536/125097
ISBN: 978-1-62841-462-2
ISSN: 0277-786X
DOI: 10.1117/12.2077391
Journal: High Contrast Metastructures IV
Volume: 9372
Appears in Collections:Conferences Paper