Title: In-situ doping of erbium in hydrogenated amorphous carbon by low temperature metalorganic radio frequency plasma enhanced chemical vapor deposition
Authors: Hsu, Hui-Lin
Leong, Keith R.
Halamicek, Michael
Teng, I-Ju
Mahtani, Pratish
Juang, Jenh-Yih
Jian, Sheng-Rui
Qian, Li
Kherani, Nazir P.
Department of Electrophysics
Keywords: Erbium metalorganic compound;Hydrogenated amorphous carbon (a-C:H);Fluorination
Issue Date: 3-Nov-2014
Abstract: A significant improvement in the photoluminescence of erbium doped amorphous carbon (a-C: H(Er)) is reported. The effects of the RF power on the anode and cathode a-C: H films were investigated in terms of the microstructural and local bonding features. It was determined that Er doped a-C: H films should be placed on the anode to obtain wider bandgap and lower percentage of sp(2) carbon bonding. The metalorganic compound, tris(6,6,7,7,8,8,8-heptafluoro-2,2-dimethyl-3,5-octanedionate) Erbium(+III) or Er(fod)(3), was incorporated in-situ into an a-C: H host by metalorganic rf plasma enhanced chemical vapor deposition. This technique provides the capability of doping Er in a vertically uniform profile. The high erbium concentration (3.9 at.%), partial fluorination of the surrounding ligands, and the large optical bandgap of the host a-C: H are the primary factors that enable enhancement of the photoluminescence. (C) 2014 Elsevier B. V. All rights reserved.
URI: http://dx.doi.org/10.1016/j.tsf.2014.02.038
ISSN: 0040-6090
DOI: 10.1016/j.tsf.2014.02.038
Volume: 570
Begin Page: 429
End Page: 435
Appears in Collections:Conferences Paper

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