標題: Nanotribological properties of ALD-processed bilayer TiO2/ZnO films
作者: Wang, Wun-Kai
Wen, Hua-Chiang
Cheng, Chun-Hu
Hung, Ching-Hua
Chou, Wu-Ching
Yau, Wei-Hung
Yang, Ping-Feng
Lai, Yi-Shao
機械工程學系
電子物理學系
Department of Mechanical Engineering
Department of Electrophysics
關鍵字: CVD coatings;Nanotribology;Scratch testing;Sliding friction
公開日期: 1-十二月-2014
摘要: TiO2/ZnO films grown by atomic layer deposition (ALD) demonstrated nanotribological behaviors using scratch testing. TEM profiles obtained an amorphous structure TiO2 and nanocrystalline structure ZnO, whereas the sample has significant interface between the TiO2/ZnO films. The experimental results show the relative XRD peak intensities are mainly contributed by a wurtzite oxide ZnO structure and no signal from the amorphous TiO2. With respect to tribology, increased friction causes plastic deformation between the TiO2 and ZnO films, in addition to delamination and particle loosening. The plastic deformation caused by adhesion and/or cohesion failure is reflected in the nanoscratch traces. The pile-up events at a loading penetration of 30 nm were measured at 21.8 mu N for RT, 22.4 mu N for 300 degrees C, and 36 mu N for 400 degrees C. In comparison to the other conditions, the TiO2/ZnO films annealed at 400 degrees C exhibited higher scratch resistance and friction with large debris, indicating the wear volume is reduced with increased annealing temperature and loading. (C) 2014 Elsevier Ltd. All rights reserved.
URI: http://dx.doi.org/10.1016/j.microrel.2014.07.148
http://hdl.handle.net/11536/124089
ISSN: 0026-2714
DOI: 10.1016/j.microrel.2014.07.148
期刊: MICROELECTRONICS RELIABILITY
Volume: 54
Issue: 12
起始頁: 2754
結束頁: 2759
顯示於類別:期刊論文


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