標題: Laser Direct Imaging of Transparent Indium Tin Oxide Electrodes Using High Speed Stitching Techniques
作者: Cheng, Pi-Ying
Hsiao, Wen-Tse
Chung, Chien-Kai
Tseng, Shih-Feng
Liao, Ien-Chang
機械工程學系
Department of Mechanical Engineering
關鍵字: electrode patterning;high speed stitching technique;ultraviolet laser;indium tin oxide (ITO);laser direct imaging (LDI)
公開日期: 1-九月-2014
摘要: To accomplish an electrode patterning in large area, we present a high speed stitching technique used in an ultraviolet laser processing system and investigate the interaction between laser beams and indium tin oxide (ITO) thin films deposited on glass substrates. After optimizing the process parameters of the laser direct imaging (LDI) for the large-area electrode patterning, the ablated lines looked like regularly fish-scale marks of about a 40 mu m diameter and a 120 nm depth around the processing path. The parameters includes the laser power of 1 W, the scanning speed of galvanometers of 800 mm/s, and the laser pulse repetition frequency of 50 kHz. Moreover, the resistance value of the ablated ITO thin film is larger than 200M Omega that is electrically insulated from the other regions of electrode structure. LDI technology with UV laser beam has great potential applications in patterning on wafer or sapphire substrates and patterning a conductive layer deposited on the touch panels for semiconductor and optoelectric industries, respectively. (C) 2014 The Japan Society of Applied Physics
URI: http://hdl.handle.net/11536/123991
ISSN: 1340-6000
期刊: OPTICAL REVIEW
Volume: 21
起始頁: 732
結束頁: 735
顯示於類別:期刊論文


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  1. 000344641800048.pdf