標題: Characterization of imprinting polymeric temperature variation with fluorescent Rhodamine B molecule
作者: Ko, FH
Weng, LY
Ko, CJ
Chu, TC
材料科學與工程學系奈米科技碩博班
Graduate Program of Nanotechnology , Department of Materials Science and Engineering
關鍵字: nanoimprint lithography;imprinting temperature variation;Rhodamine B molecule
公開日期: 1-Apr-2006
摘要: The method to measure the imprint temperature variation of resist film with fluorescence probe technique was established. The maximal Rhodamine B concentration was 8 X 10(-4) M to achieve higher sensitivity and avoid precipitation problem. The temperature effect was a critical parameter on the temperature sensing, while imprinting pressure was not. The fluorescence intensity of Rhodamine B linearly decayed with time at various temperatures due to the formation of lactone-containing molecule during thermal stressing. The usual imprint time of less than 20 min was not affected by the signal decay effect due to limited percentage of signal variation during 100200 degrees C. The technique based on fluorescence probe method was successfully applied to measure the resist temperature variation of the imprint on the resist film of 6-in. wafer. (c) 2006 Elsevier B.V. All rights reserved.
URI: http://dx.doi.org/10.1016/j.mee.2006.01.009
http://hdl.handle.net/11536/12395
ISSN: 0167-9317
DOI: 10.1016/j.mee.2006.01.009
期刊: MICROELECTRONIC ENGINEERING
Volume: 83
Issue: 4-9
起始頁: 864
結束頁: 868
Appears in Collections:Conferences Paper


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