標題: Fabricating and characterizing oblique polymer structures by electron beam writing on resist-coated SiO2 wafers
作者: Ko, FH
Chen, JK
Chang, FC
材料科學與工程學系奈米科技碩博班
應用化學系
Graduate Program of Nanotechnology , Department of Materials Science and Engineering
Department of Applied Chemistry
關鍵字: electron beam technology;plasma treatment;surface oblique structure
公開日期: 1-四月-2006
摘要: We have successfully fabricated SU-8 materials having oblique structures by a new electron beam technology.-We studied the contrast, sensitivity, etching, and thermal properties of SU-8, PMMA, and KrF resists to evaluate their suitability for the fabrication of oblique structures. Among these resists, SU-8 revealed the lowest contrast ratio, highest throughput, and best thermal stability, and so it became the candidate material for patterning the oblique structures. The technique we have developed involves five regional exposures of a thick SU-8 resist layer with various electron beam dosages. Furthermore, we discuss the surface morphology, reaction mechanism, and hydrophobicity after subjecting the SU-8 resist to a series of plasma treatments. The formation of surface nano-nodules during oxygen plasma treatment explains the surface hydrophobicity. We have carefully evaluated the effects of the electron beam writing dose and the design of the exposure area with respect to the inclined angle of the fabricated structure. (c) 2006 Elsevier B.V. All rights reserved.
URI: http://dx.doi.org/10.1016/j.mee.2006.01.027
http://hdl.handle.net/11536/12392
ISSN: 0167-9317
DOI: 10.1016/j.mee.2006.01.027
期刊: MICROELECTRONIC ENGINEERING
Volume: 83
Issue: 4-9
起始頁: 1132
結束頁: 1137
顯示於類別:會議論文


文件中的檔案:

  1. 000237581900120.pdf