標題: Study on the interface thermal stability of metal-oxide-semiconductor structures by inelastic electron tunneling spectroscopy
作者: Huang, CF
Tsui, BY
Tzeng, PJ
Lee, LS
Tsai, MJ
電子工程學系及電子研究所
Department of Electronics Engineering and Institute of Electronics
公開日期: 26-六月-2006
摘要: The bias polarity-dependent inelastic electron tunneling spectroscopy is employed to detect the thermal stability of the Ta-Pt/SiO2/Si and Ta-Pt/HfO2/Si structures. This work provides a direct evidence that the Fermi-level pinning of metal gates is counted for the generation of extrinsic states due to interface interaction. A Ta2O5 layer forms at the Ta-Pt/SiO2 interface during thermal annealing whereas only an intermittent Ta-O bond is observed at the Ta-Pt/HfO2 interface. Although the heat of formation of HfO2 is lower than that of SiO2, Si presumably diffuses into HfO2 layer and replaces Hf atoms during the high-temperature annealing. (c) 2006 American Institute of Physics.
URI: http://dx.doi.org/10.1063/1.2219140
http://hdl.handle.net/11536/12130
ISSN: 0003-6951
DOI: 10.1063/1.2219140
期刊: APPLIED PHYSICS LETTERS
Volume: 88
Issue: 26
結束頁: 
顯示於類別:期刊論文


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