標題: Simulation for optimization of mask error enhancement factor by design of experiments in both dry and immersion ArF lithography
作者: Yeh, Kwei-Tin
Lin, Chih-Hung
Hu, Ji-Ren
Loong, Wen-An
應用化學系
Department of Applied Chemistry
關鍵字: mask error enhancement factor;process window;Taguchi design of experiment;immersion lithography
公開日期: 1-八月-2006
摘要: Simulations for the optimization of the mask error enhancement factor (MEEF) by using Taguchi's design of experiment (DOE) method in both dry and immersion ArF lithography have been demonstrated here. By DOE, MEEF has been successfully reduced, and the process window hash also been enlarged. Furthermore, in immersion lithography, MEEF has been significantly reduced, and resolution is also enhanced. In this study, we determined the optimal process and optical parameters to enlarge the process window and reduce MEEFs for different types of mask by DOE.
URI: http://dx.doi.org/10.1143/JJAP.45.6216
http://hdl.handle.net/11536/11988
ISSN: 0021-4922
DOI: 10.1143/JJAP.45.6216
期刊: JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS
Volume: 45
Issue: 8A
起始頁: 6216
結束頁: 6224
顯示於類別:期刊論文


文件中的檔案:

  1. 000240512800031.pdf