Title: The effect of Os interlayers on the thermal stability of magnetic CoFe/OsMn films
Authors: Peng, Tai-Yen
Lo, C. K.
Chen, San-Yuan
Yao, Y. D.
材料科學與工程學系
Department of Materials Science and Engineering
Keywords: Thermal stability;Os interlayer;Mn diffusion;CoFe/Os/OsMn;CoFe/Os/IrMn
Issue Date: 1-Sep-2006
Abstract: The thermal stability of a multilayer structure of protection layer/Co(90)Fe(10)/Os (d nm)/Os(20)Mn(80) has been studied as functions of annealing temperature (Tan) and thickness of Osmium (Os) layer. The insertion of a thin Os layer between the Co(90)Fe(10)/Os(20)Mn(80) interface shows better thermal stability. No diffusion evidence was found for samples with d >= 0:3 nm as examined by Auger electron spectroscopy depth profile at different annealing temperatures up to 400 degrees C. These samples with Os layer showed the same magnetic behavior and the hysteresis loop with squareness (S) larger than 0.9 were observed before and after annealing. (C) 2006 Elsevier B.V. All rights reserved.
URI: http://dx.doi.org/10.1016/j.jmmm.2006.01.173
http://hdl.handle.net/11536/11844
ISSN: 0304-8853
DOI: 10.1016/j.jmmm.2006.01.173
Journal: JOURNAL OF MAGNETISM AND MAGNETIC MATERIALS
Volume: 304
Issue: 1
Begin Page: E50
End Page: E52
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