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dc.contributor.authorHuang, Shih-Cheen_US
dc.contributor.authorKao, Yu-Hanen_US
dc.contributor.authorTai, Ya-Hsiangen_US
dc.date.accessioned2014-12-08T15:15:21Z-
dc.date.available2014-12-08T15:15:21Z-
dc.date.issued2006-11-25en_US
dc.identifier.issn0040-6090en_US
dc.identifier.urihttp://dx.doi.org/10.1016/j.tsf.2006.07.127en_US
dc.identifier.urihttp://hdl.handle.net/11536/11522-
dc.description.abstractLaser recrystallized low-temperature poly-silicon (LTPS) films have attracted attention for their application in thin-film transistors (TFTs), which are widely used in active matrix display. However, the degradation behavior of p-type LTPS TFTs is not quite clarified yet. In this paper, the instability mechanisms of p-channel LTPS TFTs under DC bias stress have been investigated. From the IV transfer curves, it was observed that LTPS TFT's mobility increases after stress at some bias conditions. This degradation is most likely caused by interface traps between the poly-Si thin film and the gate insulator, as well as the damaged junction of the drain from stress. In this work, the assumption is examined via C-V measurement. It is found that the C-GD curves of the stressed TFT slightly increase for the gate voltage smaller than the flat band voltage V-FB. However, the C-Gs curves of the stressed device are almost the same as those before stress. By employing simulation, it is found that the degradation of p-type TFTs under this stress condition is mainly caused by the trapped charges at the interface between the gate and the drain region, which is generated by the high voltage difference applied during DC bias stress. (c) 2006 Elsevier B.V. All rights reserved.en_US
dc.language.isoen_USen_US
dc.subjectthin film transistoren_US
dc.subjectpoly-Sien_US
dc.subjectLTPSen_US
dc.subjectp-typeen_US
dc.subjectC-V (capacitance-voltage) measurementen_US
dc.titleStudy on electrical degradation of p-type low-temperature polycrystalline silicon thin film transistors with C-V measurement analysisen_US
dc.typeArticle; Proceedings Paperen_US
dc.identifier.doi10.1016/j.tsf.2006.07.127en_US
dc.identifier.journalTHIN SOLID FILMSen_US
dc.citation.volume515en_US
dc.citation.issue3en_US
dc.citation.spage1206en_US
dc.citation.epage1209en_US
dc.contributor.department光電工程學系zh_TW
dc.contributor.department顯示科技研究所zh_TW
dc.contributor.departmentDepartment of Photonicsen_US
dc.contributor.departmentInstitute of Displayen_US
dc.identifier.wosnumberWOS:000242639600071-
Appears in Collections:Conferences Paper


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