標題: Electron beam lithography on cylindrical roller
作者: Tseng, Shih Chun
Peng, Wen Yang
Hsieh, Yi Fan
Lee, Ping Jen
Lai, Wen Lang
材料科學與工程學系
Department of Materials Science and Engineering
關鍵字: Electron beam lithography;Ni electroforming template;Cylindrical roller
公開日期: 1-五月-2010
摘要: We developed a nano-structure fabrication technology over a cylindrical roller using electron beam lithography (EBL) and a specimen rotation apparatus. The high-resolution patterning is done on a cylindrical roller specimen and it is achieved by controlling the thickness of photo-resistance (PR) and dosage of the electron beam (EB). We successfully obtained homogeneous arrays of one-third circle grating with a nano-scale width 100 nm and a large area of 6 x 3.5 mm square. Couples of the "ITRI" character marks were also fabricated. The stitching control was accurately derived using the in-house made two-axis rotation system, which provides the smallest stitching of about 1.6 mu m. The minimum feature size of 100 nm over the cylindrical roller is demonstrated. Moreover, the Nicole template with "ITRI" character pattern on the cylindrical roller was also successfully made, of which thickness is about 80 nm. (C) 2009 Elsevier B.V. All rights reserved.
URI: http://dx.doi.org/10.1016/j.mee.2009.11.156
http://hdl.handle.net/11536/11456
ISSN: 0167-9317
DOI: 10.1016/j.mee.2009.11.156
期刊: MICROELECTRONIC ENGINEERING
Volume: 87
Issue: 5-8
起始頁: 943
結束頁: 946
顯示於類別:會議論文


文件中的檔案:

  1. 000276300700066.pdf