標題: Evaluation research of polishing methods for large area diamond films produced by chemical vapor deposition
作者: Tsai, H. Y.
Ting, C. J.
Chou, C. P.
機械工程學系
Department of Mechanical Engineering
關鍵字: diamond film polishing;chemical-assisted mechanical polishing;catalytic reaction assisted grinding;thermo-clieniical polishing
公開日期: 1-二月-2007
摘要: The current study compared several polishing techniques of chemical vapor deposition (CVD) diamond films. Although research on various diamond polishing techniques has been carried for years, some issues still need to be examined in order to facilitate application on large areas in a cost-efficient manner. In the present work, microwave plasma enhanced chemical vapor deposition (CVD) was used to obtain diamond films with full width half magnitude (FWHM) less than 10 wavenummbers at 1332 cm(-1) Raman peak. The diamond films were processed through mechanical polishing, chemical-assisted mechanical polishing, thermo-chemical polishing, excimer laser ablation, and catalytic reaction assisted grinding. A profilometer, an atomic force microscope, and a scanning electron microscope have been used to evaluate the surface morphology of diamond Films before and after polishing. The results obtained by using the above mentioned techniques were analyzed and compared. (c) 2006 Elsevier B.V. All rights reserved.
URI: http://dx.doi.org/10.1016/j.diamond.2006.06.007
http://hdl.handle.net/11536/11183
ISSN: 0925-9635
DOI: 10.1016/j.diamond.2006.06.007
期刊: DIAMOND AND RELATED MATERIALS
Volume: 16
Issue: 2
起始頁: 253
結束頁: 261
顯示於類別:期刊論文


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