|標題:||Novel epoxy nanocomposite of low D-k introduced fluorine-containing POSS structure|
Department of Applied Chemistry
|關鍵字:||POSS;dielectric constant;epoxy resin;nanocomposite|
|摘要:||A nanoporous additives, polyhedral oilgomeric silisesquioxane containing eight functional hexafluorine groups, octakis(dimethylsiloxyhexafluoropropyl ether)silsesquioxane (OF) has been synthesized and blended with the UV-cured epoxy resin. The OF containing (10%) epoxy has significantly lower dielectric constant (2.65) than the plain epoxy (3.71). The incorporation of fluorine containing additives is well-known to reduce dielectric constant due to lower its polarizability. In addition, the presence of the bulky POSS structure is able to create additional free space or pores and further reduces the dielectric constant of the epoxy matrix. (c) 2007 Wiley Periodicals, Inc.|
|期刊:||JOURNAL OF POLYMER SCIENCE PART B-POLYMER PHYSICS|
|Appears in Collections:||Articles|
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