標題: Low refractive index Si nanopillars on Si substrate
作者: Lin, Gong-Ru
Chang, Ya-Chung
Liu, En-Shao
Kuo, Hao-Chung
Lin, Huang-Shen
光電工程學系
Department of Photonics
公開日期: 30-四月-2007
摘要: Low refractive index of a stalagmitelike high-aspect-ratio Si nanopillar array on Si dry etched using a self-aggregated Ni nanodot mask is demonstrated, which exhibits two minimum reflectances of 1.23 and 1.4 with corresponding refractive indices of 1.25 and 1.48 at 400 and 1200 nm, respectively. Angular dependency of the transverse electrical mode reflectance at 632.8 nm of the surface roughened Si nanopillar array is released, and the Brewster angle of 63 degrees with equivalent refractive index of 1.5 is determined. (C) 2007 American Institute of Physics.
URI: http://dx.doi.org/10.1063/1.2736281
http://hdl.handle.net/11536/10880
ISSN: 0003-6951
DOI: 10.1063/1.2736281
期刊: APPLIED PHYSICS LETTERS
Volume: 90
Issue: 18
結束頁: 
顯示於類別:期刊論文


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  1. 000246210000054.pdf