標題: Micro knife-edge optical measurement device in a silicon-on-insulator substrate
作者: Chiu, Yi
Pan, Jiun-Hung
電控工程研究所
Institute of Electrical and Control Engineering
公開日期: 14-五月-2007
摘要: The knife-edge method is a commonly used technique to characterize the optical profiles of laser beams or focused spots. In this paper, we present a micro knife-edge scanner fabricated in a silicon-on-insulator substrate using the micro-electromechanical-system technology. A photo detector can be fabricated in the device to allow further integration with on-chip signal conditioning circuitry. A novel backside deep reactive ion etching process is proposed to solve the residual stress effect due to the buried oxide layer. Focused optical spot profile measurement is demonstrated. (C) 2007 Optical Society of America.
URI: http://dx.doi.org/10.1364/OE.15.006367
http://hdl.handle.net/11536/10801
ISSN: 1094-4087
DOI: 10.1364/OE.15.006367
期刊: OPTICS EXPRESS
Volume: 15
Issue: 10
起始頁: 6367
結束頁: 6373
顯示於類別:期刊論文


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  1. 000246474300050.pdf