標題: Polybenzoxazine as a mold-release agent for nanoimprint lithography
作者: Wang, Chih-Feng
Chiou, Shih-Feng
Ko, Fu-Hsiang
Chen, Jem-Kun
Chou, Cheng-Tung
Huang, Chih-Feng
Kuo, Shiao-Wei
Chang, Feng-Chih
材料科學與工程學系奈米科技碩博班
應用化學系
Graduate Program of Nanotechnology , Department of Materials Science and Engineering
Department of Applied Chemistry
公開日期: 22-May-2007
摘要: One of the most important tasks remaining to be resolved in nanoimprint lithography is the elimination of the resist sticking to the mold during demolding. Previously, the main approach was to apply a thin layer of fluorinated alkyl silane mold-release agent on the surface on the mold; however, this involves complicated steps and high costs. The low surface free energy material polybenzoxazine provides an efficient mold-release agent for silicon molds that is easier to process, costs less, and has no side reactions.
URI: http://dx.doi.org/10.1021/la062921e
http://hdl.handle.net/11536/10786
ISSN: 0743-7463
DOI: 10.1021/la062921e
期刊: LANGMUIR
Volume: 23
Issue: 11
起始頁: 5868
結束頁: 5871
Appears in Collections:Articles