標題: High-coercivity CoPt alloy films grown by sputtering
作者: Hu, JP
Lin, P
交大名義發表
材料科學與工程學系
National Chiao Tung University
Department of Materials Science and Engineering
公開日期: 1-九月-1996
摘要: CoXPt1-X alloy films (x=0.2 similar to 0.4) were prepared by rf sputtering at substrate temperatures 150 similar to 300 degrees C without Pt underlayer and post annealing. The magnetic properties of the films showed strong dependence on the composition and substrate temperature. High coerivity (similar to 191 KA/m) and saturated remanence were achieved st conditions x=0.25 and 200 degrees C. In contrast to the previous observations, the high perpendicular magnetic anisotropy, is tbe current case, appealed aot associated with the good CoPt (111) texture. Au interpretation based on minor composition modulation is the films was proposed.
URI: http://dx.doi.org/10.1109/20.539310
http://hdl.handle.net/11536/1062
ISSN: 0018-9464
DOI: 10.1109/20.539310
期刊: IEEE TRANSACTIONS ON MAGNETICS
Volume: 32
Issue: 5
起始頁: 4096
結束頁: 4098
顯示於類別:會議論文


文件中的檔案:

  1. A1996VM25800238.pdf