標題: Plasma device for liquid crystal alignment
作者: Chao, Ru-Pin
Wu, Hsin-Ying
Wang, Chih-Chieh
Chang, Shao-Ju
Hwang, Jenn-Chang
Kou, Chwung-Shan
Wu, Kuen-Yi
Lee, An-Ping
Wei, Hsiao-Kuan
公開日期: 5-Jun-2008
摘要: A device utilizes a plasma for a liquid crystal alignment. The alignment is processed in a vacuum chamber in a simple way. A general chemical vapor deposition is coordinated to reduce cost. The present invention is a novel contactless process avoiding particle contamination, residual static charge and scratch. And multiple are as of the present invention can be used for alignment.
官方說明文件#: H05H001/46
URI: http://hdl.handle.net/11536/105596
專利國: USA
專利號碼: 20080129207
Appears in Collections:Patents


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  1. 20080129207.pdf