標題: 12吋矽晶圓半導體VCD製程設備及BST介電薄膜成長研究---總計畫(I)
Research and Development of CVD Process Equipment for a 12-Inch Single Silicon Wafer and Growth of BST Dielectric Thin Film (I)
作者: 林清發
LIN TSING-FA
交通大學機械工程系
關鍵字: CVD反應爐;薄膜成長;熱流設計;矽晶圓;CVD reactor;Thin film growth;Thermel fluid design;Silicon wafer
公開日期: 2000
官方說明文件#: NSC89-2212-E009-037
URI: http://hdl.handle.net/11536/103100
https://www.grb.gov.tw/search/planDetail?id=501199&docId=90359
Appears in Collections:Research Plans


Files in This Item:

  1. 892212E009037.pdf