標題: 12吋矽晶圓半導體CVD製程設備及BST介電薄膜成長研究---子計畫I:12吋矽晶圓CVD製程設備的加熱及成長BST薄膜之進氣系統設計與反應爐系統整合(I)
Design of Heating Assembly and Gas Feeding Unit for BST Thin Film Growth and Integration of CVD Reactor System for a 12-Inch Single Silicon Wafer (I)
作者: 林清發
LIN TSING-FA
交通大學機械工程系
關鍵字: CVD反應爐;加熱設計;流力設計;CVD reactor;Heating design;Flow design
公開日期: 2000
官方說明文件#: NSC89-2212-E009-038
URI: http://hdl.handle.net/11536/101659
https://www.grb.gov.tw/search/planDetail?id=501193&docId=90357
Appears in Collections:Research Plans


Files in This Item:

  1. 892212E009038.pdf