Fabrications of Polymer Vertical Comb Drive with Photo Resist as Main Structure Materials
|關鍵字:||正型光阻;負型光阻;垂直梳狀致動器;雙面;positive photo resist;negative photo resist;vertical comb drive;double side|
Vertical comb drive (VCD) is one of the most famous components in micro electro mechanical systems (MEMS) due to its superior characteristics in out-of-plane motion. To date, most of the reported VCDs were fabricated by silicon-based micromachining using silicon-based materials as the main structural material, and exhibit a high cost solution by the DRIE process or SOI-wafers. In contrast to silicon, the polymer is becoming an attractive alternative, not just for its low cost, but also for its integration capability with other components due to the low-temperature process. However, no polymer -based VCD has been reported yet. Our research group recently has developed a double-side multiple partial exposure (DoMPE) process to enhance the complexity of the suspended microstructure made of positive photo resist. By combining metal deposition technology, one of the goals in this proposal is to fabricate the polymer vertical comb drive made of positive photo resist using the DoMPE process. Since the negative photo resist, SU-8, is famous for its excellent material properties, here the DoMPE process for negative photo resist will be further investigated, and acted as the fabrication method for the polymer vertical comb drive made of negative photo resist. The investigation is proposed to be a two-year plan. In the first year, the main objective will be the design, fabrication, and testing of the polymer vertical comb drive made of positive photo resist, and establishment on key process parameters in negative photo-resist DoMPE process. In the second year, DoMPE process for positive and negative photo resists will both be established and compared. Also, the polymer vertical comb drive made of SU-8 will be designed, fabricated, and characterized.