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Issue DateTitleAuthor(s)
1-Oct-1994THE COMBINED EFFECTS OF LOW-PRESSURE NH3-ANNEALING AND H-2 PLASMA HYDROGENATION ON POLYSILICON THIN-FILM TRANSISTORSYANG, CK; LEI, TF; LEE, CL; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
1-Aug-1994MULTIPLE-ANGLE INCIDENT ELLIPSOMETRY MEASUREMENT ON LOW-PRESSURE CHEMICAL-VAPOR-DEPOSITED AMORPHOUS-SILICON AND POLYSILICONCHAO, TS; LEE, CL; LEI, TF; 電子工程學系及電子研究所; 奈米中心; Department of Electronics Engineering and Institute of Electronics; Nano Facility Center
1-Nov-1995POST-POLYSILICON GATE-PROCESS-INDUCED DEGRADATION ON THIN GATE OXIDELAI, CS; LEI, TF; LEE, CL; CHAO, TS; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
1-Dec-1995CHARACTERISTICS OF POLYCRYSTALLINE FILMS GROWN BY ULTRAHIGH-VACUUM CHEMICAL-VAPOR-DEPOSITION SYSTEMLIN, HY; LEI, TF; LIN, HC; CHANG, CY; TWU, RC; DENG, RC; LIN, JD; 電子物理學系; Department of Electrophysics
1-Oct-1995A NOVEL PLANARIZATION OF TRENCH ISOLATION USING POLYSILICON REFILL AND ETCHBACK OF CHEMICAL-MECHANICAL POLISHCHENG, JY; LEI, TF; CHAO, TS; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
7-Feb-1994DEPOSITION OF IN-SITU BORON-DOPED POLYCRYSTALLINE SILICON FILMS AT REDUCED PRESSURESLIN, HC; LIN, HY; CHANG, CY; LEI, TF; WANG, PJ; DENG, RC; LIN, JD; 電控工程研究所; Institute of Electrical and Control Engineering
1-Jun-1995ENHANCED H-2-PLASMA EFFECTS ON POLYSILICON THIN-FILM TRANSISTORS WITH THIN ONO GATE-DIELECTRICSYANG, CK; LEE, CL; LEI, TF; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
1-May-1995FOURIER-TRANSFORM INFRARED SPECTROSCOPIC STUDY OF OXIDE-FILMS GROWN IN PURE N2OCHAO, TS; CHEN, WH; LEI, TF; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
1-Feb-1995CHARACTERISTICS OF BORON-DIFFUSION IN POLYSILICON SILICON SYSTEMS WITH A THIN SI-B LAYER AS DIFFUSION SOURCECHEN, TP; LEI, TF; LIN, HC; CHANG, CY; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
1-Sep-1993CHARACTERIZATION OF SEMIINSULATING POLYCRYSTALLINE SILICON PREPARED BY LOW-PRESSURE CHEMICAL-VAPOR-DEPOSITIONCHAO, TS; LEE, CL; LEI, TF; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics